Precursor for chemical vapor deposition. Properties.

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HHe
LiBeBCNOFNe
NaMgAlSiPSClAr
KCaScTiVCrMnFeCoNiCuZnGaGeAsSeBrKr
RbSrYZrNbMoTcRuRhPdAgCdInSnSbTeIXe
CsBaHfTaWReOsIrPtAuHgTlPbBiPoAtRn
FrRaRfDbSgBhHsMtDsRgCnNhFlMcLvTsOg
LaCePrNdPmSmEuGdTbDyHoErTmYbLu
AcThPaUNpPuAmCmBkCfEsFmMdNoLr